GEW has launched its EOS power and control platform at LOUPE Americas 2026 in Chicago, replacing the company’s RHINO Power infrastructure. The platform introduces redesigned power supplies, control electronics, cabling and UV system control software. GEW said the changes are intended to improve efficiency, modularity, equipment integration and maintenance across its UV curing systems. The company manufactures the technology in-house.
EOS incorporates serialised lampheads designed to provide expanded telemetry and integration options for original equipment manufacturers. The platform also supports modern communication protocols and offers new reporting functions, including operating-hour and reflector counters as standard.
GEW has added enhanced remote-monitoring capabilities and end-to-end encryption for communications traffic. The platform remains compatible with the company’s patented ArcLED technology, which allows printers and converters to interchange between mercury arc and LED curing systems.
“EOS will completely transform the functionality, capability and integration of our UV curing systems,” said Robert Rae, managing director at GEW. “It brings a more seamless and ergonomic operator experience, and its superb connectivity enables a huge variety of control and I/O options to be integrated, creating more telemetry and data for enhanced analyses.”
The launch is aimed at printers, converters and equipment manufacturers seeking additional production data, remote system visibility and greater integration between UV curing equipment and press controls. GEW has not provided pricing or a timetable for wider market availability in the supplied announcement.
At LOUPE Americas, the manufacturer is also presenting its DoseGuard precision control system and a new Air Blast Cooler. The event provides GEW with a platform to introduce the redesigned control architecture to customers and equipment partners in the Americas within the printing and converting industries.